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掩模版清洗机设备/Mask Cleaner

掩模版清洗机设备/Mask Cleaner

Kzone has completed independent research and development of mask cleaning machine equipment for sizes from G2.5 to G6 and above

Cleaning quality:No mura, water mark, rust, stain or damage

Flatness100-micron level

Total pitch variation (TPV)micron level

Quantity of defects10ea

Transport repeatabilityMillimeter level

Temperature stability±1°(within 60°

Ultrasonic

1、Complex-frequency ultrasonic wave in 4 bands, whose frequency can be freely switched

2、Spherical wave ultrasonic technology without dead zone


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